GALACTIC GAVA 500 CAPVD PVD sputtering machine

GALACTIC GAVA 500 CAPVD PVD sputtering machine was built in 2022 in Poland. This extremely technically advanced system is designed to coat, among others, cutting tools, moulds and punches with super-durable coatings with high resistance to abrasion and chemical agents. The CAPVD (Cathodic Arc Physical Vapour Deposition) method used, compared to standard PVD methods, allows highly dense and adherent coatings to be produced with good deposition rates and thicknesses (± 5 nm).

In the process, atoms from a source (cathode) placed in the working chamber are vaporised using an electric arc. These atoms then transfer and deposit onto the surface of the workpieces, creating a thin coating. The GAVA 500 PVD sputtering machine is equipped with all the necessary components of the best technical specifications and meets the highest industry standards.

Technical specifications of the GALACTIC GAVA 500 CAPVD PVD sputtering machine

• PLC controller: MITSUBISHI A1S1
• coating types: TiN, TiCN,TiAlN, TiAlNEX, CrN, ZrN, CrAlN, TiSiAlN, AlCrN, ZrO, CrCO
• vacuum chamber dimensions (dia. x h): ⌀600 x 600 mm
• maximum workpiece weight: 500 kg
• maximum vacuum: 5x 6-10 mbar
• CAPVD evaporator (2 pcs.)
• Roots pump: LEYBOLD 501 S (2 pcs.)
• Roots pump capacity: 4040 m3/h
• Roots pump pressure: 3-10 mbar
• turbomolecular pump: LEYBOLD MAGiNTEGRA
• turbomolecular pump capacity: 2000 l/s
• turbomolecular pump pressure: 6-10 mbar
• compressor
• cooling device (chiller)
• satellite grips (18 pcs.)
• process gas distribution: mass flowmeters with sensors
• temperature control: K-type thermocouple
• power supply of the GALACTIC GAVA 500 CAPVD machine: 3x 400 V; 50 Hz